
EGENĀ 5308 [0.5 credit] Integrated Circuit and Device Technology
Survey of technology used in silicon VLSI integrated circuit fabrication. Crystal growth and crystal defects, oxidation, diffusion, ion implantation and annealing, gettering, CVD, etching, materials for metallization and contacting, and photolithography. Structures and fabrication techniques required for submicron MOSFETs. Applications in advanced CMOS processes.
Prerequisite(s): enrolment in the M.Eng.- Engineering Practice program.